CHINESE JOURNAL OF PHYSICS VOL. 38, NO. 2-II APRIL 2000




Fermi and Anti-Fermi Glass Transition and Subband Resonant Quantum Tunneling in Nb/Ti Metallic Multilayer Films

Juh Tzeng Lue1, Shang-Yu Liang1, Yuh-Wei Lee1, and Hang Ting Lue2

1Department of Physics, National Tsing Hua University,

Hsinchu, Taiwan 300, R.O.C.

2Department of Electronic Engineering, National Chao Tung University,

Hsinchu, Taiwan 300, R.O.C.

(Received August 17, 1999)

Multilayer of Nb/Ti and NbN/Ti films with 30 periodic structure were sputtered onto silicon substrates. The current-voltage characteristics measured along the vertical junction at low temperatures exhibit nonlinear step-wise curves. The resonant subband quantum tunneling in the metallic multiple quantum wells can satisfactorily cxpress these peculiar behaviors. The Fermi and anti-Fermi glass transition showing itinerant metallic and insulating conduction properties are also observed at low currents and near critical temperatures.

PACS. 73.40.-c $\;$- Electronic transport in interface structures.
PACS. 73.50.-h $\;$- Electronic transport phenomena in thin films.
PACS. 73.40.Rw - Metal-insulator-metal structures.


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